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NanoMapper® FA

• NanoMapper FA

 

Product Highlights:

• Automated wafer nanotopography measurement
• Measurement features:
  • Able to accurately repeat measurements
  • Sub-nanometer height resolution
• Software features:
  • Measure nanotography to the edge of the wafer
  • Single-statistic pass/fail threshold curve analysis
  • User editable recipes

Factory Automated Nanotopography

NanoMapper FA has all the analysis options of its R and D brother, but features full factory automation, including FOUP, SMIF and open cassette capabilities.

With NanoMapper FA, you can have:

NanoMapper FA is an automated, precision surface mapping system available for research, analytical and process control applications for 200mm and 300mm wafers.Using proprietary, optical interferometry from ADE Phase Shift, the system characterizes polished wafer surfaces by providing whole wafer topology measurements.

Measuring surface height directly, NanoMapper FA provides the sub-nanometer sensitivity necessary to address the process development needs for leading edge semiconductor device design rules down to 0.1 micron. Interactive 3-D graphics and powerful analysis software allow rapid visualization and quantification of polishing process effects. These effects include nanotopology defects that ultimately limit wafer usability during semiconductor device fabrication. The result is faster process development and precision process control during production, with reduced wafer scrap costs.